Surface Science
Scanning Probe Microscopy
X-Ray Diffraction
Nuclear Magnetic Resonance
Thin Film
Optical Characterisation
Electrical/Magnetic Characterisation
Thermal Analysis
Sample Preparation-General
Sample Preparation-Electron_Microscopy
Element Analysis
Nano Fabrication
Liquid Helium Plant
Scanning Electron Microscopy-SEM
Transmission Electron Microscopy-TEM
Mask Aligner
Model:
OAI 804TSA
Status:
Operational
Location:
2145
Description:
Single sided photo lithography. - up to 100mm diameter full wafers and small piece below 100mm diameter. -The exposure system is compatible with photoresist in Near, Mid or Deep UV range. Resolution is up to 1um.
Remark:
Six sessions available per week.Max. booking for 2 sessions per week.
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